主要用途

1. Ion Beam Etching to fabricate micro-nanometer features in any material (metals, insulators, organics, composites, multilayers).

2. Ion Beam Surface Modification to create nanostructures, textures and smoothness.

3. Physical Vapor Deposition to build thin films and stacks by evaporation, sputtering and reactive growth.

4. Ion Beam Sputter Deposition confronts the need for upper tier thin film results, when achieving the highest quality properties and precision control is justified.

優(yōu)勢(shì)

Multifunctional Process Tool combines etching and deposition in one vacuum process chamber.

系統(tǒng)構(gòu)成 刻蝕圖例

應(yīng)用領(lǐng)域

1. Semiconductor 2. Nanotechnology 3. Photonics 4. Spintronics

適應(yīng)的刻蝕材料

1. Noble Metals ；

2. Insulators

3. Diamond Films

4. Optical Wave Guides

5. Superconducting Materials

6. Magnetic Materials

工藝能力

1. Ion Beam Etching (IBE)

2. Reactive Ion Beam Etching (RIBE)